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Title:
有機反射防止膜の組成物及びその製造方法
Document Type and Number:
Japanese Patent JP3602076
Kind Code:
B2
Abstract:
Organic anti-reflective polymer is a compound of formula (1) and is useful for fabricating ultrafine patterns of 64M, 256M, 1G, and 4G DRAM semiconductor devices since it eliminates standing waves caused by the optical properties of lower layers on the wafer and by the thickness changes of the photoresist. Organic anti-reflective polymer is a compound of formula (1): [Image] R a>- R c>hydrogen or methyl; R a- R d, and R 1- R 9-H, -OH, -OCOCH 3, -COOH, -CH 2OH, or substituted or unsubstituted, or straight or branched alkyl or alkoxy alkyl having 1 - 5 C; l, m and n : an integer selected from 1, 2, 3, 4 and 5; and x, y, and z : mole fraction from 0.01 - 0.99. Independent claims are also included for: (A) an anti-reflective coating composition comprising a compound (1) and a compound of formula (2); and (B) a method for preparing an anti-reflective coating comprises: (i) dissolving compound (1) and compound (2) in an organic solvent; (ii) filtering the obtained solution alone or in combination with an anthracene derivative; (iii) coating the filtrate on a lower layer; and (iv) hard-baking the coated layer. [Image] R 10- R 11straight or branched substituted 1 - 10C alkoxy; and R 12hydrogen or methyl.

Inventors:
San Yun Hong
Min Ho Yun
Jae Chang Yun
Jun Soo Lee
Kei ho bike
Application Number:
JP2001200453A
Publication Date:
December 15, 2004
Filing Date:
July 02, 2001
Export Citation:
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Assignee:
HYNIX SEMICONDUCTOR INC.
International Classes:
G03F7/11; C08F220/36; C08F220/40; C09D5/32; C09D133/00; G03F7/004; G03F7/09; H01L21/027; (IPC1-7): C08F220/36; C09D5/32; C09D133/00; G03F7/11; H01L21/027
Domestic Patent References:
JP2002097231A
JP7330838A
JP2001049231A
JP10330432A
JP2002097176A
JP2002072488A
JP2001031721A
JP2001194799A
JP2001027810A
Attorney, Agent or Firm:
Kenji Yoshida
Jun Ishida