Title:
COMPOSITION FOR PHOTOCURABLE NANOIMPRINT AND PATTERNING METHOD
Document Type and Number:
Japanese Patent JP2014003284
Kind Code:
A
Abstract:
To provide a composition for photocurable nanoimprint having excellent etching resistance of chlorine gas, facilitating transfer of a pattern, and ensuring excellent adhesion of the pattern to a substrate, excellent releasability from a die, good dispersibility, and excellent productivity.
The composition for photocurable nanoimprint contains (A) a hydrolysis mixture containing a hydrolysate of fluorination organic silane compound, a hydrolysate of an organic silicon compound having a (meth)acryl group, and a hydrolysate of a specific metal alkoxide, (B) a polymerizable monomer having a (meth)acryl group, and (C) a photopolymerization initiator. A hydrolysate of an organic silicon compound may be added to the hydrolysis mixture of (A).
More Like This:
Inventors:
UMEKAWA HIDEKI
KANAGAWA KIYOTADA
KANAGAWA KIYOTADA
Application Number:
JP2013106889A
Publication Date:
January 09, 2014
Filing Date:
May 21, 2013
Export Citation:
Assignee:
TOKUYAMA CORP
International Classes:
H01L21/027; B29C59/02; C08G77/58; C08G79/00; C08F230/08; C08F290/06
Domestic Patent References:
JP2010067935A | 2010-03-25 | |||
JP2009206196A | 2009-09-10 | |||
JP2010006870A | 2010-01-14 | |||
JP2008202022A | 2008-09-04 | |||
JPH06293879A | 1994-10-21 | |||
JP2005527110A | 2005-09-08 | |||
JP2009208317A | 2009-09-17 | |||
JP2008194894A | 2008-08-28 | |||
JP2011074128A | 2011-04-14 | |||
JP2003340844A | 2003-12-02 | |||
JPH0327002A | 1991-02-05 |
Foreign References:
WO2012053543A1 | 2012-04-26 | |||
WO2012002413A1 | 2012-01-05 | |||
WO2011161944A1 | 2011-12-29 | |||
WO2011148890A1 | 2011-12-01 |
Previous Patent: SEMICONDUCTOR LIGHT-EMITTING DEVICE AND LIGHT SOURCE UNIT
Next Patent: LOW METAL CONTENT CONDUCTIVE PASTE COMPOSITION
Next Patent: LOW METAL CONTENT CONDUCTIVE PASTE COMPOSITION