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Title:
COMPOSITION FOR POLISHING MAGNETIC DISK SUBSTRATE
Document Type and Number:
Japanese Patent JP2001323253
Kind Code:
A
Abstract:

To obtain a polishing liquid composition capable of increasing the polishing speed of a magnetic disk substrate.

This composition for polishing the magnetic disk substrate is a polishing liquid comprising water, a polishing material and a polishing accelerator and the polishing accelerator is composed of at least one kind selected from the group consisting of a divalent or more polyvalent carboxylic acid having either one of alkene group (C=C), alkyne group (C≡C), ether group (C-O-C), thioether group (C-S-C), ketone group [(C=O)] or an aromatic ring as a functional group and a salt thereof.


Inventors:
OOSHIMA YOSHIAKI
FUJII SHIGEO
Application Number:
JP2000141021A
Publication Date:
November 22, 2001
Filing Date:
May 12, 2000
Export Citation:
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Assignee:
KAO CORP
International Classes:
B24B57/02; B24B37/00; C09K3/14; G11B5/84; (IPC1-7): C09K3/14; B24B37/00; B24B57/02; G11B5/84
Attorney, Agent or Firm:
Yoshinori Hosoda