Title:
COMPOSITION FOR REMOVING MAKEUP COSMETIC
Document Type and Number:
Japanese Patent JPH09143028
Kind Code:
A
Abstract:
To obtain the above composition having excellent removing effect for a makeup cosmetic and low skin irritation, giving fresh feeling and free from sticky feeling in use and after washing and causing no troubles of dry feeling and rough skin after use.
This composition is obtained by compounding one kind or more selected from polyoxyethylenemethyl glycosides and polyoxypropylenemethyl glycosides and one kind or more of nonionic surfactants having HLB values of ≥10. Preferably, the compounding ratio of the former is 5.0-4.0wt.%, and that of the latter is ≤8.0wt.%.
Inventors:
NAKAE IWAKAZU
Application Number:
JP32394295A
Publication Date:
June 03, 1997
Filing Date:
November 17, 1995
Export Citation:
Assignee:
NOEVIR KK
International Classes:
A61K8/00; A61K8/60; A61Q1/02; A61Q1/14; A61Q19/10; (IPC1-7): A61K7/02; A61K7/50
Attorney, Agent or Firm:
Takei Masumi
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