COMPOSITION SUPERIOR IN WETTABILITY FOR WET ETCHING SEMICONDUCTOR

Title:

COMPOSITION SUPERIOR IN WETTABILITY FOR WET ETCHING SEMICONDUCTOR

Document Type and Number:

Japanese Patent JP3449365

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To obtain a composition superior in wettability for wet etching and having all the characteristics of the conventional detergents.
SOLUTION: A composition for wet etching semiconductor is characterized by adding a detergent consisting of two components of an alkyl sulfonic acid and an ω-hydrofluoroalkyl carboxylic acid to buffered hydrofluoric acid consisting of hydrogen fluoride, ammonium fluoride, and water.

Inventors:

Masao Ishii
Tomohiro Hosomi
Shigeru Maruyama
Mitsuji Itano

Application Number:

JP2001150740A

Publication Date:

September 22, 2003

Filing Date:

February 02, 1994

Export Citation:

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Assignee:

Daikin Industries, Ltd.

International Classes:

C09K13/08; C23F1/24; H01L21/308; (IPC1-7): H01L21/308

Domestic Patent References:

JP6039176A
JP353083A
JP3179737A
JP63283028A

Attorney, Agent or Firm:

Iwao Tamura

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