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Title:
COMPOSITION FOR TOPCOAT, AND FORMING METHOD OF PATTERN USING THE SAME
Document Type and Number:
Japanese Patent JP2011195819
Kind Code:
A
Abstract:

To provide a composition for a topcoat which gives a highly fine and highly accurate pattern, especially in immersion lithography, by photolithography using a high-energy line or an electron beam which is an electromagnetic wave with a wavelength of 300 nm or less.

The composition for the topcoat contains a repeating unit shown by general formula (1). In formula (1), R1, R2, R3 and R4 are each independently H, 1-6C straight chain alkyl, 3-6C branched-chain alkyl, or 3-6C cyclic alkyl; R5s are each independently H, F, 1-6C straight chain alkyl, 3-6C branched-chain alkyl, or 3-6C cyclic alkyl, fluorine may be contained; and Rfs are is each independently 1-4C straight chain perfluoroalkyl.


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Inventors:
NADANO AKIRA
AKIBA SHINYA
MIYAUCHI KOICHI
Application Number:
JP2011032027A
Publication Date:
October 06, 2011
Filing Date:
February 17, 2011
Export Citation:
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Assignee:
CENTRAL GLASS CO LTD
International Classes:
C09D133/16; C08F22/20; C09D133/08; C09D133/10; G03F7/11
Domestic Patent References:
JP2004161827A2004-06-10
JP2005187804A2005-07-14
JP2005213215A2005-08-11
JP2007204385A2007-08-16
Attorney, Agent or Firm:
Makoto Koide



 
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