Title:
犠牲的反射防止材料の湿式剥離除去のための組成物および方法
Document Type and Number:
Japanese Patent JP2005533896
Kind Code:
A
Abstract:
A composition and process for wet stripping removal of sacrificial anti-reflective silicate material, e.g., from a substrate or article having such material deposited thereon, particularly where the sacrificial anti-reflective material is present with permanent silicate materials desired to be unaffected by the wet stripping composition.
Inventors:
Baum, Thomas, H.
Burn hard, david
Minsek, David
Murphy, Melissa
Burn hard, david
Minsek, David
Murphy, Melissa
Application Number:
JP2004523443A
Publication Date:
November 10, 2005
Filing Date:
July 16, 2003
Export Citation:
Assignee:
Advanced Technology Materials, Inc.
International Classes:
C03C15/00; C09K13/08; G03F7/42; H01L21/02; H01L21/308; H01L21/311; H01L21/306; (IPC1-7): C09K13/08; H01L21/308
Attorney, Agent or Firm:
Yoshiyuki Inaba
Katsuro Tanaka
Shinji Oga
Katsuro Tanaka
Shinji Oga