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Title:
材料除去作業を行うための組成物及び方法
Document Type and Number:
Japanese Patent JP7368600
Kind Code:
B2
Abstract:
A composition suitable for chemical mechanical polishing a substrate can comprise abrasive particles, a multi-valent metal borate, at least one oxidizer and a solvent. The composition can polish a substrate with a high material removal rate and a very smooth surface finish.

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JPWO2007138975Abrasive composition and polishing method
Inventors:
Fu, Lin
Sherlock, Jason A.
Buoy, Long Hui
Ward, Douglas E.
Application Number:
JP2022511273A
Publication Date:
October 24, 2023
Filing Date:
August 27, 2020
Export Citation:
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Assignee:
SAINT-GOBAIN CERAMICS AND PLASTICS, INC.
International Classes:
C09K3/14; B24B37/00; C09G1/02; H01L21/304
Domestic Patent References:
JP2000144109A
JP2009302255A
Foreign References:
WO2017212971A1
Attorney, Agent or Firm:
Patent Attorney Corporation Otsuka International Patent Office
Patent Attorney Corporation Asamura Patent Office



 
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