Title:
COMPOUND, RESIN CONTAINING STRUCTURAL UNIT DERIVED THEREFROM, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023047332
Kind Code:
A
Abstract:
To provide a resist composition from which a resist pattern having good CD uniformity (CDU) can be produced.SOLUTION: The resist composition contains a resin containing a structural unit represented by formula (I) and an acid generator. [In the formula, R0 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; X1 represents *-O-**, *-CO-O-**, -Ax-Ph-Ay-** or the like; Ph represents a phenylene group; Ax and Ay each represent a bond such as a single bond, an ether bond or an ester bond; L1 represents a single bond or an optionally substituted hydrocarbon group; ring W represents an optionally substituted alicyclic hydrocarbon ring; Xa and Xb each represent an oxygen atom or a sulfur atom; and X2 represents a hydrocarbon group having an alicyclic hydrocarbon group.]SELECTED DRAWING: None
Inventors:
KITA YUJI
AONO YOSHIMASA
ICHIKAWA KOJI
AONO YOSHIMASA
ICHIKAWA KOJI
Application Number:
JP2022149983A
Publication Date:
April 05, 2023
Filing Date:
September 21, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/038; C07D319/08; C07D407/12; C07D407/14; C08F20/10; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP