Title:
化合物及びリチウム含有膜の製造方法
Document Type and Number:
Japanese Patent JP7153094
Kind Code:
B2
Abstract:
The present invention provides a compound having a low melting point, enhanced volatility, and excellent thermal stability, and a method for producing a lithium-containing film. The compound is represented by the following formula (1).(In the formula (1), A is a nitrogen atom, a phosphorus atom, a boron atom, or an aluminum atom;E1 and E2 are independently a carbon atom, a silicon atom, a germanium atom, or a tin atom;R1 to R6 are independently a hydrogen atom or a C1-10 hydrocarbon group having a constituent atom optionally substituted with a heteroatom; however, all of R1 to R6 may not be a hydrogen atom;D is a monodentate or polydentate neutral ligand structure;x is 0 or an integer of 1 or greater, and y is an integer of 1 or greater; however, if A is a nitrogen atom and none of the carbon atoms constituting R1 to R6 is substituted with a heteroatom, x is a number of 1 or greater and y is a number of 1 or greater; andif there are more than one of A, E1, E2, and R1 to R6, these may be the same or different.)
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Inventors:
Dusara Christian
Duplan Vincent
Yumi Ikeda
Duplan Vincent
Yumi Ikeda
Application Number:
JP2020571029A
Publication Date:
October 13, 2022
Filing Date:
December 17, 2019
Export Citation:
Assignee:
Rail Liquide-Societe Anonym Pools Retude e Rex Prosatation de Procede Georges Claude
International Classes:
C23C16/40; C01B25/30; C07F1/02; C07F7/10; C07F9/50; C07F19/00
Domestic Patent References:
| JP2014500401A | ||||
| JP2013214510A |
Foreign References:
| WO2005008828A1 |
Attorney, Agent or Firm:
Patent Business Corporation Unias International Patent Office
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