Title:
COMPOUND, POLYMER COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2013181126
Kind Code:
A
Abstract:
To provide a new compound, a polymer compound and use methods thereof.
There is provided a compound of formula (1-1), where in the formula, Y1 and Y2 are each independently a single bond or a bivalent linking group; R1 and R2 are each independently a hydrocarbon group which may have a substituent or a group represented by formula (1-2), where at least either thereof is a group represented by formula (1-2); V1 is an optionally substituted 1-4C fluorinated alkylene group; Mm+ is an m-valent counter cation; and m is an integer of 1 to 3.
Inventors:
KOMURO YOSHITAKA
UTSUMI YOSHIYUKI
UTSUMI YOSHIYUKI
Application Number:
JP2012046935A
Publication Date:
September 12, 2013
Filing Date:
March 02, 2012
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
C08F22/24; C07C309/12; C07C381/12; C07D327/04; C09K3/00; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
JP2012003249A | 2012-01-05 | |||
JP2011252147A | 2011-12-15 | |||
JP2010077404A | 2010-04-08 | |||
JP2009258695A | 2009-11-05 |
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi
Previous Patent: LABEL AND INK COMPOSITION FOR LABEL PRINTING
Next Patent: POLYMER GEL, AND POLYMER GEL SHEET
Next Patent: POLYMER GEL, AND POLYMER GEL SHEET