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Title:
COMPOUND, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2018024847
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a resist composition capable of producing a resist pattern with good CD uniformity (CDU).SOLUTION: The resin contains a structural unit represented by formula (I0) [A, Aand Aeach independently represent a C2-18 divalent hydrocarbon group; R, R, Rand Reach independently represent a hydrogen atom or a C1-6 saturated hydrocarbon group; Xand Xeach independently represent *-O-CO-, *-O-CO-O-, or -O-; and * represents a bonding position to Aor A].SELECTED DRAWING: None

Inventors:
SAKAMOTO HIROSHI
ICHIKAWA KOJI
Application Number:
JP2017140637A
Publication Date:
February 15, 2018
Filing Date:
July 20, 2017
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C08F2/38; C08F22/10; C08G75/045; G03F7/20
Domestic Patent References:
JP2009042748A2009-02-26
JP2006249225A2006-09-21
Foreign References:
WO2005085301A12005-09-15
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto



 
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