Title:
化合物、樹脂、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7389567
Kind Code:
B2
Abstract:
To provide a compound that makes it possible to produce a resist pattern with excellent line edge roughness (LER).SOLUTION: The present invention provides, for example, the following compound (IA-1).SELECTED DRAWING: None
Inventors:
Mutsuko Higo
Kaoru Araki
Koji Ichikawa
Kaoru Araki
Koji Ichikawa
Application Number:
JP2019102190A
Publication Date:
November 30, 2023
Filing Date:
May 31, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D305/06; C08F220/26; G03F7/039; G03F7/20
Domestic Patent References:
| JP2017095444A | ||||
| JP2016535320A | ||||
| JP2013231163A |
Foreign References:
| WO2001055084A1 | ||||
| KR1020100009110A | ||||
| WO2015012341A1 |
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP