Title:
COMPOUND, RESIN, RESIST COMPOSITION AND PRODUCTION METHOD OF RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020158495
Kind Code:
A
Abstract:
To provide a compound, a resin and a resist composition containing the resin, from which a resist pattern having good CD uniformity (CDU) can be produced.SOLUTION: The compound is represented by formulae (I-1) to (I-4), or the like; and the resin and the resist composition contain a structural unit derived from the above compound.SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2020048881A
Publication Date:
October 01, 2020
Filing Date:
March 19, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C69/608; C07D321/10; C08F20/28; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation