Title:
COMPOUND, RESIN, RESIST COMPOSITION AND PRODUCTION METHOD OF RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020158496
Kind Code:
A
Abstract:
To provide a compound from which a resist pattern with good line edge roughness (LER) can be produced.SOLUTION: The compound is represented by formula (I). In the formula, R1 represents an alkyl group having 1 to 6 carbon atoms, H, or a halogen atom; X1 represents a connecting group such as -COO-C6H5-COO-; A1 represents a single bond or the like; A3 represents an alkanediyl group having 1 to 6 carbon atoms; W represents a divalent alicyclic hydrocarbon group having 3 to 18 carbon atoms; and R2 represents a substituted/unsubstituted hydrocarbon group having 1 to 28 carbon atoms.SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2020048882A
Publication Date:
October 01, 2020
Filing Date:
March 19, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C69/608; C07D307/00; C07D321/10; C08F20/30; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation