Title:
COMPOUND, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2022173128
Kind Code:
A
Abstract:
To provide a resist composition having a good focus margin (DOF).SOLUTION: There are provided: a compound represented by a formula (I); and a resist composition containing the compound. [R1 represents *-R10 or *-L2-CO-O-R10; R2 represents *-CO-O-R10, *-L2-CO-O-R10 or the like; and R10 represents a group represented by a formula (IC).]SELECTED DRAWING: None
Inventors:
KITA YUJI
USAGAWA DAN
ICHIKAWA KOJI
USAGAWA DAN
ICHIKAWA KOJI
Application Number:
JP2022075861A
Publication Date:
November 17, 2022
Filing Date:
May 02, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07D303/16; C07D305/06; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation