Title:
化合物、樹脂、組成物並びにレジストパターン形成方法及び回路パターン形成方法
Document Type and Number:
Japanese Patent JP7069529
Kind Code:
B2
Abstract:
Provided is a compound represented by formula (0). (0) (RY is a C1–30 alkyl group or a C6–30 aryl group; RZ is a C1–60 N-valent group or a single bond; and RT is a C1–30 alkyl group, a C6–30 aryl group, a C2–30 alkenyl group, a C1–30 alkoxy group, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a thiol group, a hydroxyl group, or a group in which a hydrogen atom of the hydroxyl group has been substituted with a hydroxyalkyl group or a glycidyl group (the alkyl group, aryl group, alkenyl group, and alkoxy group may include an ether bond, ketone bond, or ester bond), wherein at least one RT includes a group in which a hydrogen atom of the hydroxyl group has been substituted with a hydroxyalkyl group or has been substituted with a glycidyl group. X represents an oxygen atom or a sulfur atom, or is uncrosslinked; m is an integer from 0 to 9 (with at least one m being an integer from 1 to 9); N is an integer from 1 to 4; and r is an integer from 0 to 2.)
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Inventors:
Masatoshi Echigo
Application Number:
JP2018528887A
Publication Date:
May 18, 2022
Filing Date:
July 21, 2017
Export Citation:
Assignee:
Mitsubishi Gas Chemical Co., Ltd.
International Classes:
C07D311/78; C07C43/23; C08G59/20; G03F7/004; G03F7/038; G03F7/11; G03F7/26
Domestic Patent References:
| JP2004277460A | ||||
| JP2013087173A | ||||
| JP5067699A | ||||
| JP2000109650A | ||||
| JP48029751A | ||||
| JP7206996A | ||||
| JP2111743A | ||||
| JP2009275148A |
Foreign References:
| WO2013024778A1 | ||||
| KR101532341B1 | ||||
| WO2016002607A1 | ||||
| US2626939 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Kazuhiko Naito
Toshifumi Onuki
Kazuhiko Naito
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