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Title:
導電性高分子エッチング用インク及び導電性高分子のパターニング方法
Document Type and Number:
Japanese Patent JP5733304
Kind Code:
B2
Abstract:
Disclosed are: an ink for conductive polymer etching, which has excellent etching ability for conductive polymers and provides a pattern with high accuracy; and a method for patterning a conductive polymer using the ink for conductive polymer etching. Specifically disclosed are: an ink for conductive polymer etching, which is characterized by containing an etchant for conductive polymers, a thickening agent and an aqueous medium; and a method for patterning a conductive polymer, wherein the ink for conductive polymer etching is used.

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Inventors:
Yasuo Nishimura
Takashi Ihara
Hiroshi Taguchi
Application Number:
JP2012509453A
Publication Date:
June 10, 2015
Filing Date:
March 28, 2011
Export Citation:
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Assignee:
Toagosei Co., Ltd.
International Classes:
C09D11/00; C09K13/00; C09K13/04; H01B13/00; H01L21/306; H05K3/06
Domestic Patent References:
JP2010021137A
JP8157329A
JP11191369A
Foreign References:
WO2008041461A1
Attorney, Agent or Firm:
Yasuhiro Noguchi
Akiko Deep Sea



 
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