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Title:
接続材料、接続材料の製造方法、半導体装置、半導体装置の製造方法、パワーモジュール
Document Type and Number:
Japanese Patent JP5723523
Kind Code:
B2
Abstract:

To solve such problems of a conventional semi-conductor device connected by using a Zn/Al/An clad material that the thermal stress caused by the difference in coefficient of thermal expansion can not be mitigated during the die bonding in the semi-conductor device, and a semi-conductor element can be destroyed, and that if the joining temperature is high at ≥390-400°C, the heat resistance of a peripheral member including joined members such as an Si chip and frame must be at least ≥400°C, options of the members are decreased.

The joining material is composed of an Al-based alloy layer containing metals of one or more out of Mg, Sn, Ge, Ga, Bi and In, and a Zn-based alloy layer provided on an outermost surface of the Al-based alloy layer.

COPYRIGHT: (C)2011,JPO&INPIT


Inventors:
Masahide Okamoto
Yasushi Ikeda
Yuki Murasato
Application Number:
JP2009209957A
Publication Date:
May 27, 2015
Filing Date:
September 11, 2009
Export Citation:
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Assignee:
株式会社日立製作所
International Classes:
H01L21/52; B23K35/14; B23K35/22; B23K35/28; B23K35/40; C22C21/00
Domestic Patent References:
JP62173095A
JP2008126272A
JP11172353A
JP11207487A
JP11288955A
JP2007326137A
Attorney, Agent or Firm:
Manabu Inoue
Yuji Toda