To solve such problems of a conventional semi-conductor device connected by using a Zn/Al/An clad material that the thermal stress caused by the difference in coefficient of thermal expansion can not be mitigated during the die bonding in the semi-conductor device, and a semi-conductor element can be destroyed, and that if the joining temperature is high at ≥390-400°C, the heat resistance of a peripheral member including joined members such as an Si chip and frame must be at least ≥400°C, options of the members are decreased.
The joining material is composed of an Al-based alloy layer containing metals of one or more out of Mg, Sn, Ge, Ga, Bi and In, and a Zn-based alloy layer provided on an outermost surface of the Al-based alloy layer.
COPYRIGHT: (C)2011,JPO&INPIT
Yasushi Ikeda
Yuki Murasato
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