Title:
容器内清浄化装置および清浄化方法
Document Type and Number:
Japanese Patent JP7005887
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a container cleaning apparatus or the like for effectively cleaning a wafer transfer container.SOLUTION: A container cleaning apparatus cleans a wafer transfer container having a container main opening capable of detaching a wafer. The container cleaning apparatus comprises: a mounting part that mounts the wafer transfer container; a cleaning chamber having a device opening connected to the container main opening; an open/close mechanism that opens/closes a lid blocking the container main opening and a door blocking the device opening, and communicates the wafer transfer container and the cleaning chamber; a vacuum state formation part that discharges an air from the cleaning chamber, and creates the cleaning chamber and the wafer transfer container communicated with the cleaning chamber to be a vacuum state; and a gas introduction part that can introduce a cleaning gas into the cleaning chamber and the wafer transfer container communicated with the cleaning chamber.SELECTED DRAWING: Figure 2
Inventors:
Tadamasa Iwamoto
Application Number:
JP2016170023A
Publication Date:
January 24, 2022
Filing Date:
August 31, 2016
Export Citation:
Assignee:
tdk Corporation
International Classes:
H01L21/677; H01L21/673
Domestic Patent References:
| JP2013120760A | ||||
| JP2005340243A | ||||
| JP2004071784A | ||||
| JP2009239006A | ||||
| JP2004128428A | ||||
| JP2009164369A | ||||
| JP2011114319A |
Foreign References:
| US20100143081 |
Attorney, Agent or Firm:
Maeda/Suzuki International Patent Corporation