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Title:
汚染処理方法及び汚染処理剤
Document Type and Number:
Japanese Patent JP4001020
Kind Code:
B2
Abstract:

To execute contamination treatment safely for works in a simple manner.

Yeast and a proliferation substrate of the yeast are supplied to a treatment object containing a halogenated organic compound to dehalogenate the halogenated organic compound.

COPYRIGHT: (C)2004,JPO&NCIPI


Inventors:
Satoshi Yoneda
Hiroyuki Nakane
Application Number:
JP2003017802A
Publication Date:
October 31, 2007
Filing Date:
January 27, 2003
Export Citation:
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Assignee:
TOYOTA JIDOSHA KABUSHIKI KAISHA
International Classes:
B09B3/00; B09C1/10; C02F3/00; C02F3/30; C02F3/34; C02F11/02; C09K17/32
Domestic Patent References:
JP7299483A
JP10034128A
JP2001090353A
JP2002065248A
JP2003251331A
JP2000263075A
JP2000232876A
JP2002224659A
JP10324861A
JP11207315A
JP2000042525A
JP2002273473A
JP9001193A
JP9234454A
JP2003230872A
Attorney, Agent or Firm:
Yusuke Hiraki
Satoshi Fujita
Ishii Teiji