Title:
CONTOUR INSPECTION DEVICE
Document Type and Number:
Japanese Patent JPH01207878
Kind Code:
A
Abstract:
PURPOSE:To accurately inspect the position and the length of a crack to occur in an outline by storing picture data image-picked up by illumination and basic contour data and comparing the output of a contour tracing operator and the outline data. CONSTITUTION:For data 3-1 obtained by image-picking up the whole of a semiconductor wafer 1, the boundary between 1 and 0 is added to its contour, and the data 3-1 are stored in a memory 3 together with standard data 3-2. An outline tracing circuit 5 obtains the data values of circumferential picture elements clockwise from a start point by the contour tracing operator, moves the center of the operational rotation to a position where the data value of 1 is obtained first, and repeats the operation. Further, the circuit 5 obtains a direction whenever the center position is moved, and the obtained direction is compared with another direction to obtain the data 3-2 at that time at a corresponding point having an equal circumferential directional distance from a reading start point. A comparing circuit 6 decides that a defect exists and a tracing is impossible and outputs an alarm when the difference between both the directions becomes a prescribed margin or more. Thus, even a minute defect can be inspected easily.
Inventors:
TSUKAHARA HIROYUKI
NAKAJIMA MASAHITO
HIZUKA TETSUO
HIRAOKA NORIYUKI
KAKIMOTO GIICHI
UZUMAKI TAKUYA
NAKAJIMA MASAHITO
HIZUKA TETSUO
HIRAOKA NORIYUKI
KAKIMOTO GIICHI
UZUMAKI TAKUYA
Application Number:
JP3349488A
Publication Date:
August 21, 1989
Filing Date:
February 16, 1988
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
G01N21/88; G01N21/93; G06T1/00; G06T7/60; H01L21/66; (IPC1-7): G01N21/88; G06F15/62; G06F15/70; H01L21/66
Attorney, Agent or Firm:
Eisuke Suzuki