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Patent Searching and Data


Title:
CONTROL DEVICE AND STORAGE MEDIUM
Document Type and Number:
Japanese Patent JP2023155484
Kind Code:
A
Abstract:
To provide a technique that suppresses the generation of particles at or near the center of a substrate surface.SOLUTION: A control device causes a substrate processing apparatus to execute the following (A) to (D). (A) A processing liquid is supplied to the center position of a rotating substrate surface. (B) The supply position of the processing liquid is moved from the center position to a first eccentric position. (C) A replacement liquid to replace the processing liquid is supplied to a second eccentric position different from the first eccentric position. (D) The supply position of the processing liquid is moved from the first eccentric position in a direction opposite to the center position, and the supply position of the replacement liquid is moved from the second eccentric position to the center position.SELECTED DRAWING: Figure 6

Inventors:
SAKURAI HIROKI
KOSAI KAZUKI
SHINOHARA KAZUYOSHI
Application Number:
JP2023142630A
Publication Date:
October 20, 2023
Filing Date:
September 04, 2023
Export Citation:
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Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/304
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito