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Patent Searching and Data


Title:
CONTROL SYSTEM FOR PROCESS AND PRESSURE
Document Type and Number:
Japanese Patent JP3160539
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To improve the performance characteristics of process.
SOLUTION: The control system 1 for process uses an analog control circuit and in this circuit, a differential amplifier stage 54 is incorporated in a feedback path rather than a feedforward path to enable control over a high nonlinear process indicating high hysteresis level. In addition, when the output of the process is in a specific range, an automatic control circuit which varies the gains of various stages is incorporated in the control circuit and to control a nonlinear proportional valve 18 having strict hysteresis. The valve 18 adjusts the pressure in a pressure-driven ophthalmologic operation instrument 42 and should be controlled extremely accurately so as to successfully operate on the eye.


Inventors:
Christopher C. Jung
Douglas E. Wallace, Junior
Application Number:
JP27618896A
Publication Date:
April 25, 2001
Filing Date:
October 18, 1996
Export Citation:
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Assignee:
Archon Laboratories, Inc.
International Classes:
G05B11/32; G05B11/36; G05B11/42; A61F9/007; G05D16/20; (IPC1-7): G05B11/36; A61F9/007; G05B11/42
Domestic Patent References:
JP5274040A
JP5337150A
JP375906A
Attorney, Agent or Firm:
Takashi Ishida (3 others)