CONTROLLING EQUIPMENT OF DAMPENING SOLUTION

Japanese Patent JP3248303

B2

PURPOSE: To control precisely and properly the concentration of an etching liquid in a dampening solution by providing an ion concentration measuring means for measuring the concentration of a selected ion contained in the etching liquid in the dampening solution, a dampening solution temperature measuring means, an ion concentration information correcting means and an etching liquid concentration adjusting means.
CONSTITUTION: The concentration of one king of ion selected from negative ions of a nitric acid ion, a nitrous acid ion, a fluovide ions, a sulfate ion and a sulfide ion and positive ions of a sodium ion, an ammonia ion and a potassium ion, which are contained in an etching liquid in a dampening solution, e.g. the concentration of the nitric acid ion, is measured by an ion concentration sensor for the nitric acid ion and calibrated by the information on the concentration of the nitric acid ion for calibration. Next, a change in the concentration of the nitric acid ion in the dampening solution, which is based on the temperature of the dampening solution, is corrected and the concentration of the nitric acid ion thus corrected is converted into the concentration of the etching liquid. The information on the concentration of the etching liquid is compared with a threshold value set and inputted beforehand through an etching liquid concentration setting switch, and based on the result of judgement as to relative magnitude, a start/stop signal is outputted to an etching liquid supply pump.

Toru Sudo
Takashi Kuramoto
Yasuhiro Senou
Masao Motegi
Hisato Urase

JP16785893A

January 21, 2002

July 07, 1993

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Toppan Printing Co., Ltd.

B41F7/24; B41F7/32; B41F33/10; (IPC1-7): B41F7/32; B41F7/24; B41F33/10

JP631543A

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