To improve characteristics in an electromagnetic or optical device, in terms of accurately and easily processing adjustment in characteristics, causing no trouble in a manufacturing method in adding a step to conventional processes, and using no expensive materials.
A fine-particle layer is formed to add it to the device by laminating a plurality of planar structures with fine particles 2 dispersed planarly, using a sputtering process and the like. In this case, the fine particles 2 are formed of semiconductor material such as Si and the like, and by using a semiconductor layer 3 for a material around the fine particle they can be utilized as a quantum-dot structure. The effect due to plasmon on a localized surface is utilized by using metallic particle for the fine particles 2. Both fine particles are added independently or concurrently to the device, so as to constitute the assisting layer to improve the electromagnetic or optical characteristics.
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