Title:
近距離場顕微鏡検査におけるサブ波長アパチャ・アレイの位置および方向の制御
Document Type and Number:
Japanese Patent JP2004505312
Kind Code:
A
Abstract:
Systems and methods for near-field, interferometric microscopy are disclosed in which a mask having an array of sub-wavelength apertures is used to couple near-field probe beams to a sample. The periphery of the mask further includes one or more larger apertures to couple light to the sample that forms the basis of an interferometric signal indicative of the relative distance between the mask and the sample. The interferometric signal can be the basis of a control signal in a servo system that dynamically positions the mask relative to the sample.
Inventors:
Hill, Henry Allen
Application Number:
JP2002515498A
Publication Date:
February 19, 2004
Filing Date:
July 27, 2001
Export Citation:
Assignee:
Zetetic Institute
International Classes:
G02B21/00; G01Q10/06; G01Q60/18; G01Q60/22; (IPC1-7): G02B21/00
Attorney, Agent or Firm:
Hironobu Onda
Makoto Onda
Makoto Onda