Title:
CONTROLLING SYSTEM FOR FIXED LIGHT QUANTITY OF REDUCTION PROJECTING EXPOSURE DEVICE
Document Type and Number:
Japanese Patent JPS5835529
Kind Code:
A
Abstract:
PURPOSE: To measure the quantity of exposure accurately, by arranging an illuminance sensor on a shutter.
CONSTITUTION: A reticle 6 is illuminated with the light of a lamp 1 which is condensed by a converging lens 2, and its image is projected to a water 7 through a reduction lens 5. An illuminance sensor 8 which inputs an exposure intensity signal to an integration controlling circuit 4 is attached onto a shutter 6. Since the illuminance sensor 8 is arranged on a light path 9 while the shutter 6 is closed, the intensity of the illumination light is measured accurately.
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Inventors:
TSUYUKI HISAMASA
HAYASHI SOUICHIROU
HAYASHI SOUICHIROU
Application Number:
JP13414381A
Publication Date:
March 02, 1983
Filing Date:
August 28, 1981
Export Citation:
Assignee:
HITACHI LTD
International Classes:
G03B27/72; (IPC1-7): G03B27/72
Attorney, Agent or Firm:
Akio Takahashi