Title:
COPOLYMER PHOTORESIST HAVING IMPROVED ETCHING RESISTANCE
Document Type and Number:
Japanese Patent JP3470967
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a photoresist composition having so improved resolution as to enable high resolution lithography performance using imaging radiation of 193 nm.
SOLUTION: The photoresist composition is obtained by using an imaging copolymer so as to improve a known alternating copolymer-base photoresist. The imaging copolymer is characterized by the presence of at least a third monomer which enhances the resolution of the photoresist. The performance of the composition is further improved by using a bulky acid active protective group on the imaging copolymer. An alkyl functional cyclicolefin is particularly suitable for use as the third monomer.
Inventors:
Robert Di Allen
Philip Joe Block
Richard Anthony Dipietro
Hiroshi Ito
Pushkar Lao Varanasi
Philip Joe Block
Richard Anthony Dipietro
Hiroshi Ito
Pushkar Lao Varanasi
Application Number:
JP2001130713A
Publication Date:
November 25, 2003
Filing Date:
April 27, 2001
Export Citation:
Assignee:
INTERNATIONAL BUSINESS MASCHINES CORPORATION
International Classes:
C08F222/06; C08F222/40; C08F232/00; C08K5/00; C08L45/00; G03F7/004; G03F7/039; G03F7/11; G03F7/40; H01L21/027; (IPC1-7): G03F7/039; C08F222/06; C08F222/40; C08F232/00; C08K5/00; C08L45/00; G03F7/004; G03F7/11; G03F7/40; H01L21/027
Domestic Patent References:
| JP10111569A | ||||
| JP10198035A | ||||
| JP9230595A | ||||
| JP1010739A | ||||
| JP10153864A | ||||
| JP10307401A | ||||
| JP1031720A | ||||
| JP2000298350A | ||||
| JP2001183839A | ||||
| JP2001228613A |
Other References:
【文献】国際公開97/033198(WO,A1)
Attorney, Agent or Firm:
Hiroshi Sakaguchi (1 person outside)