Title:
共重合体及び感光性樹脂組成物
Document Type and Number:
Japanese Patent JP5451048
Kind Code:
B2
Abstract:
The invention provides a copolymer, which is taken as a photosensitive resin having good fit to a substrate and capable of forming a pattern with high sensitivity and high resolving power. The copolymer is obtained by the polymerization of the following monomer mixture at least comprising a vinyl monomer with a plurality of C = C double bonds in the molecule [except (methyl) polyacrylate derivatives and (methyl) acrylamide derivatives] (vinyl monomer A) and a vinyl monomer with carboxyl or carboxylic acid anhydride and one C = C double bond in the molecule (vinyl monomer B). The vinyl monomer A is a compound of the formula (1), wherein, R<1> is hydrogen atom or optionally alkyl with substituents, R<2>, R<3> and R<4> are the same or different and hydrogen atom or methyl, X is a connecting group, and n is an integer of 1 to 3.
Inventors:
Twenty years of age
Kenichiro Mimura
Kenichiro Mimura
Application Number:
JP2008311097A
Publication Date:
March 26, 2014
Filing Date:
December 05, 2008
Export Citation:
Assignee:
Daicel Corporation
International Classes:
C08F220/06; C08F212/08; C08F220/32; C08F222/04; C08F230/08; G02B5/20; G03F7/004; G03F7/038
Domestic Patent References:
| JP9151215A | ||||
| JP11015153A | ||||
| JP2003131379A | ||||
| JP8020610A |
Attorney, Agent or Firm:
Yukihisa Goto