COPOLYMER PRODUCTION METHOD, AND RESIST COMPOSITION

Japanese Patent JP2014028904

A

To provide a method of producing a copolymer useful for a resist composition, and a resist composition containing the copolymer.

The copolymer production method comprises: preparing a first solution containing a monomer represented by the general formula (3); preparing a second solution containing a polymerization initiator and a monomer having an ethylenic double bond; heating the first solution; and dripping the second solution into the heated first solution. [In the formula, Ra⁰¹ represents a lactone-containing cyclic group, a carbonate-containing cyclic group, or a -SO₂- containing cyclic group; and Ra⁰² represents a C1-C20 alkyl group.]

JP2002517547	INDUSTRIAL APPLICABILITY [Title of invention] Wax crystal modifier
JP6848196	A resin composition and an optical compensation film using the resin composition.
JP6136508	Fumaric acid Diiso propyl cinnamic acid ester bismaleimide copolymerization resin and a manufacturing method for the same

IRIE MAKIKO
TSUCHIYA JUNICHI
HORI YOICHI

JP2012170485A

February 13, 2014

July 31, 2012

Click for automatic bibliography generation  

TOKYO OHKA KOGYO CO LTD

C08F222/14; C08F220/16; G03F7/039; H01L21/027

JP2000159758A	2000-06-13
JP2000159758A	2000-06-13
JP2000336121A	2000-12-05
JP2004124082A	2004-04-22
JP2010250263A	2010-11-04
JP2004252405A	2004-09-09
JP2008248244A	2008-10-16
JP2008239889A	2008-10-09
JPH0251514A	1990-02-21
JPH06206944A	1994-07-26
JP2012224586A	2012-11-15

WO2011118490A1

2011-09-29

Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi

Previous Patent: HEAT-CONDUCTIVE LAMINATE SHEET, METHOD FOR MANUFACTURING THE HEAT-CONDUCTIVE LAMINATE SHEET, AND ELE...

Next Patent: EPOXY RESIN COMPOSITION