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Title:
COPPER COATING SUPERIOR IN OXIDATION RESISTANCE, FORMING METHOD THEREOF, AND ELECTRONIC COMPONENT THEREWITH
Document Type and Number:
Japanese Patent JP2002294488
Kind Code:
A
Abstract:

To provide a copper coating superior in oxidation resistance, a forming method thereof, and electronic components therewith.

The electronic components comprise a lead frame having a copper film superior in oxidation resistance, which is electroplated on a material made of a copper alloy to be plated, such as the lead frame, with the use of a copper plating liquid containing copper, KCN, and silver of 0.01% or more against the copper content. The copper film has such superior oxidation resistance as the thickness of the oxidized film which is generated on the surface of the copper film, by means of leaving it on a hot plate of 350°C for 10 minutes in ambient atmosphere and cooling, is only 0.4 μm or thinner when measured with a cathode reduction method.


Inventors:
HIRAOKA YUKIO
ITO MASAKI
SHIMADA SUSUMU
Application Number:
JP2001094774A
Publication Date:
October 09, 2002
Filing Date:
March 29, 2001
Export Citation:
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Assignee:
DOWA MINING CO
International Classes:
C25D3/56; C25D3/58; C25D7/00; (IPC1-7): C25D7/00; C25D3/56; C25D3/58
Domestic Patent References:
JPH01257356A1989-10-13
JPH08241947A1996-09-17
Attorney, Agent or Firm:
Maruoka Masahiko