Title:
CORRECTING METHOD FOR HARD MASK
Document Type and Number:
Japanese Patent JPS5852821
Kind Code:
A
Abstract:
PURPOSE:To redress a hard mask which is conventionally abandoned as a defective hard mask and improve the production yield of hard masks, by a method wherein a resist is applied, and only a defective part is exposed to light in order to open a window, and after the defective part is plated with a metal, the resist is peeled off. CONSTITUTION:First, a resist 5 is applied to the whole surface of a hard mask to be corrected. Then, a pinhole part of a metal pattern 2 is exposed to a spot light, and development is effected to remove the resist on the pinhole part. Then, with an electrically conductive transparent thin film 6 employed as one electrode, and with a metal 7 employed as the other electrode, the mask is immersed in a plating bath 8 and a current is supplied from a power source to carry out a metal plating. In this case, if the film 6 is connected to the minus electrode, a metal deposit 9 is formed on the pinhole part of the metal pattern 2. Then, when the resist 5 is peeled off, it is possible to obtain a hard mask having the pinhole part restored by the metal deposit 9.
Inventors:
ADACHI MASAHIKO
Application Number:
JP15102181A
Publication Date:
March 29, 1983
Filing Date:
September 24, 1981
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
G03F1/00; G03F1/72; H01L21/027; (IPC1-7): H01L21/30
Attorney, Agent or Firm:
Koshiro Matsuoka