Title:
CORRECTION OF PATTERN DEFECT
Document Type and Number:
Japanese Patent JPS56133832
Kind Code:
A
Abstract:
PURPOSE:To correct pattern defects by arranging a metallic thin film in parallel with metallic thin films at very short intervals on the upper side of the recticle on a substrate with facing the film downward wherein the part opposing to a detect is dropped for dissolution by laser light to close the defect. CONSTITUTION:Metallic thin films 2 having pattern defects are placed on a glass substrate 1 and a glass substrate 4 having the similar metallic thin film 5 is arranging by locating the film 5 on the films 2 in parallel with the films 2 at very short intervals and facing to the films 2 and laser light 7 is aimed at the film 5 through a reflector 8 and a slit 9 so that the laser light 7 may become the same dimension at the upper part of a defect 3 by transmitted illumination light 10. The film 5 adhered to the substrate 4 by the irradiation of the laser light is melted and adhered to the defect 3 on the films 2 to close the defected part. In this way, the necessity of reproducing a recticle or a metal photomask will not exist and the recticle or the metal photomask will be made in a short period.
Inventors:
YAMAZAKI TERUHIKO
HOSHIKA HARUYUKI
HOSHIKA HARUYUKI
Application Number:
JP3773180A
Publication Date:
October 20, 1981
Filing Date:
March 21, 1980
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
G03F1/00; G03F1/72; H01L21/027; (IPC1-7): H01L21/30