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Patent Searching and Data


Title:
CORRECTION SOLUTION USED FOR ELECTROPHOTOGRAPHIC OFFSET MASTER PLATE AND CORRECTION METHOD USING IT
Document Type and Number:
Japanese Patent JPS5946671
Kind Code:
A
Abstract:

PURPOSE: To enable erasion operation rapidly, easily, and always with good reproductivity, by using the entitled correction soln. contg. a polymer easily soluble in water, an org. or inorg. acid, a soluble metal compd., and a low b.p. solvent.

CONSTITUTION: A content of polymer easily soluble in water is generally 2.2W 30wt%, preferably, 1W15wt%. For example, a monomer having a carboxylic acid, such as acrylic, methacrylic, or maleic acid, is used. As the org. acid, aliphatic carboxylic acid having 1W6C or sulfonic acid, it may be a monobasic or dibasic acid. A content of soluble metal compd. is generally 0.2W30wt%, preferably, 0.5W20wt%. A content of low b.p. solvent is generally 50W99.9wt%, preferably, 70W99wt%.


Inventors:
SERA HIDEFUMI
ISHII KAZUO
Application Number:
JP15744182A
Publication Date:
March 16, 1984
Filing Date:
September 10, 1982
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03G13/26; G03G21/00; (IPC1-7): G03G13/26