Title:
カバー膜形成方法
Document Type and Number:
Japanese Patent JP7071661
Kind Code:
B2
Abstract:
The present invention is a method for forming a cover film, which comprises: a step for preparing a substrate that has a surface layer which comprises a first region and a second region that is different from the first region in the surface state; a step for coating at least a part of the surface of the substrate with a composition that contains a first polymer and a solvent; a step for heating a coating film that is formed by the coating step; and a step for removing a portion of the coating film after the heating step by means of a rinsing liquid, said portion being formed on the second region. This method for forming a cover film is also configured such that the first polymer has a first structural unit represented by formula (1) or contains a monovalent organic group that has a nitrogen atom and is bonded to at least one end of the main chain. In formula (1), R1 represents a hydrogen atom, a methyl group, a fluorine atom or a trifluoromethyl group; and A represents a monovalent organic group having a nitrogen atom.
Inventors:
大▲崎▼ 仁視
Application Number:
JP2019525671A
Publication Date:
May 19, 2022
Filing Date:
June 20, 2018
Export Citation:
Assignee:
JSR CORPORATION
International Classes:
H01L21/312
Domestic Patent References:
| JP2017107188A |
Attorney, Agent or Firm:
Amano Kazunori