Cover flux and a method for silicon refining - Silicone Materials Incorporated

Title:

Cover flux and a method for silicon refining

Document Type and Number:

Japanese Patent JP2016511734

Kind Code:

A

Abstract:

カバーフラックスの装置および方法が示される。方法および装置において、凝固フロントが鋳型の冷却面から冷却面と実質的に反対にある溶融シリコンの表面へ向かって移動するにつれて、不純物が固体シリコンから液体中へと押し出され、該シリコン上のフラックス層と反応することが示される。

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Inventors:

Turenne Align
Nouri Abdullah
Alfred Cristine

Application Number:

JP2015554264A

Publication Date:

April 21, 2016

Filing Date:

January 29, 2014

Export Citation:

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Assignee:

Silicone Materials Incorporated

International Classes:

C01B33/037; B22D21/06; F27D1/00; F27D1/18; F27D11/02; F27D11/06

Domestic Patent References:

JPS5632319A	1981-04-01
JP2012508154A	2012-04-05
JP2015530086A	2015-10-15
JPS5632319A	1981-04-01
JP2012508154A	2012-04-05

Foreign References:

CN102134075A	2011-07-27
WO2004030044A2	2004-04-08
CN102134075A	2011-07-27
WO2004030044A2	2004-04-08

Attorney, Agent or Firm:

Hatsushi Shimizu
Masao Haruna
Hirotaka Yamaguchi
Toshi Gobe
Ryuichi Inoue
Toshimitsu Sato
Koichi Niimi
Tomohiko Kobayashi
Masato Ozeki
Yoshihiro Igarashi
Kazuya Kawamoto

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