Title:
CRACKING TREATMENT DEVICE FOR PERFLUORIDE
Document Type and Number:
Japanese Patent JP3817428
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To improve the cracking efficiency of perfluoride (PFC) by a catalyst.
SOLUTION: A reactor 13 has a catalyst layer 14 packed with the catalyst containing the oxide of Al and Ni in the inside. The waste gases containing the PFC discharged from the semiconductor manufacturing device are heated to 700°C by a heater 12 in the state that the gases are added to reaction water (or steam). The heated waste gases are introduced into the catalyst layer 14 where the PFC is cracked by the catalyst to HF and CO2. The waste gasses discharged from the catalyst layer 14 are cooled by a cooler 16. The HF in the waste gasses are thereafter removed by a removing device 17. Since the catalyst layer has the catalyst containing the oxide of the Al and Ni, the cracking efficiency of the PFC is improved.
Inventors:
Kazuyoshi Irie
Toshihiro Mori
Yokoyama Hisao
Toyama Takayuki
Toshihide Takano
Shin Tamada
Shuichi Sugano
Toshihiro Mori
Yokoyama Hisao
Toyama Takayuki
Toshihide Takano
Shin Tamada
Shuichi Sugano
Application Number:
JP2001000954A
Publication Date:
September 06, 2006
Filing Date:
November 13, 1998
Export Citation:
Assignee:
株式会社日立製作所
日立エンジニアリング株式会社
日立協和エンジニアリング株式会社
日立エンジニアリング株式会社
日立協和エンジニアリング株式会社
International Classes:
B01D53/68; B01D53/86; B01D53/77; (IPC1-7): B01D53/86; B01D53/68; B01D53/77
Domestic Patent References:
JP11319485A | ||||
JP11070322A | ||||
JP10192653A | ||||
JP10252651A | ||||
JP11244656A | ||||
JP6063357A | ||||
JP10286439A | ||||
JP62273039A |
Foreign References:
US5649985 |
Attorney, Agent or Firm:
Manabu Inoue
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