Title:
160nmより短波長の光が透過する光リソグラフィ用結晶材料及び作成方法
Document Type and Number:
Japanese Patent JP2005509583
Kind Code:
A
Abstract:
The present invention provides below 160 nm optical lithography crystal materials for VUV optical lithography systems and processes. The invention provides fluoride optical lithography crystals for utilization in 157 nm optical microlithography elements which manipulate below 193 nm optical lithography photons. The present invention provides methods of making below 160 nm optical lithography crystal materials for below 160 nm VUV optical lithography systems and processes.
Inventors:
Sparrow, Robert W
Application Number:
JP2003545589A
Publication Date:
April 14, 2005
Filing Date:
November 12, 2002
Export Citation:
Assignee:
CORNING INCORPORATED
International Classes:
C30B11/00; G02B1/02; G03F7/20; C30B29/12; H01L21/027; (IPC1-7): C30B29/12; C30B11/00; H01L21/027
Attorney, Agent or Firm:
Yanagita Seiji
Go Sakuma
Go Sakuma