Title:
CUPROUS OXIDE PRECURSOR
Document Type and Number:
Japanese Patent JP2015182903
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a cuprous oxide precursor which provides a cuprous copper particle dispersion resistant to coagulation.SOLUTION: A cuprous copper precursor consists of a monovalent copper salt of a compound having a phthalic acid derivative structure and is obtained e.g. by reacting a metallic copper with a phthalic acid derivative in an amide solvent. Since a cuprous copper particle dispersion is easily producible from the precursor and the cuprous copper dispersion obtained is resistant to coagulation, the cuprous copper precursor is advantageously usable in the field of printable electronics.
Inventors:
YAMADA MUNENORI
SHIGETA AKIRA
HOSODA MASAHIRO
ECHIGO YOSHIAKI
SHIGETA AKIRA
HOSODA MASAHIRO
ECHIGO YOSHIAKI
Application Number:
JP2014058345A
Publication Date:
October 22, 2015
Filing Date:
March 20, 2014
Export Citation:
Assignee:
UNITIKA LTD
International Classes:
C01G3/00; H05K1/09