To provide a curable composition for photo nano imprint that is suitable for manufacturing cured material by photo nano imprint method.

The curable composition for photo nano imprint contains: (A) 1,4-butanediol diacrylate and/or neo-pentyl glycol diacrylate; (B) silane coupling agent; (C) silicone compound; (D) optical radical polymerization initiator; and (E) urethane compound having (meth)acryloyl group, wherein the urethane compound having (E) (meth)acryloyl group is a compound that the hydroxyl group of acrylate compound having hydroxyl group is added with isocyanate group of isocyanate compound.