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Title:
CURING COMPOSITION FOR TRANSFER MATERIAL, AND PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2011175724
Kind Code:
A
Abstract:

To provide a curing composition for transfer materials, which is suitable for a nanoimprint method in which selectivity of a dry etching speed with argon gas and oxygen gas is high, and which is capable of forming a fine pattern with a high throughput.

The curing composition for transfer materials contains an aromatic amine type (meth)acrylate compound acquired by reaction of an aromatic amine compound in which an amino group is coupled directly to an aromatic ring, and a compound having an epoxy group and a (meth)acryloyl group in molecules.


Inventors:
ARAI YOSHIKAZU
UCHIDA HIROSHI
Application Number:
JP2011012747A
Publication Date:
September 08, 2011
Filing Date:
January 25, 2011
Export Citation:
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Assignee:
SHOWA DENKO KK
International Classes:
G11B5/84; B29C59/02; C07C219/08; C08F20/36; H01L21/027
Attorney, Agent or Firm:
Patent corporation ssinpat