To provide a current introducing structure capable of keeping a vacuum state in a vacuum chamber, and enhancing durability by preventing electrolytic corrosion in a cooling medium storage part.

The current introducing structure 20 for introducing the current in an auxiliary anode 9 in a film deposition chamber 3 comprises a water-cooling jacket 15 for storing a coil 17 and cooling water Wa, an insulation conductor part 19 forming the excessive portion of the coil 17, and a sealing structure part 23 which is provided to the outer peripheral wall part 15e of the water-cooling jacket 15 and exposes the tip of the insulation conductor part 19 to the vacuum side with the insulation conductor part 19 penetrating therethrough while keeping the vacuum around the water-cooling jacket 15. As a result, any contact need not be provided between the insulation conductor part 19 and other conductor parts in the water-cooling jacket 15 for storing cooling water Wa, any possibility of electrolytic corrosion caused by the cooling water Wa can be reduced, and the durability of the coil 17 can be enhanced.

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