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Title:
CUTTING METHOD OF SINGLE CRYSTAL
Document Type and Number:
Japanese Patent JP2002025949
Kind Code:
A
Abstract:

To machine a single crystal with superior cutting faces and a small cutting loss in a cutting method for cutting the silicon single crystal by using laser machining.

In a cutting method of single crystal, a gas containing gaseous molecules or radicals which form stable gaseous molecules through reaction with the constituent atoms of the single crystal is used. While feeding the gas to the vicinity of the cutting part through a nozzle 304, the single crystal is cut by irradiating 301 the cutting part with ultra-short pulsed laser beams.


Inventors:
Omi, Tadahiro
Sugawa, Shigetoshi
Shinohara, Hisakuni
Ito, Tatsuo
Kanetani, Koichi
Application Number:
JP2000000210192
Publication Date:
January 25, 2002
Filing Date:
July 11, 2000
Export Citation:
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Assignee:
OMI TADAHIRO
SHIN ETSU HANDOTAI CO LTD
International Classes:
B23K26/00; B23K26/06; B23K26/12; B23K26/40; B28D1/22; H01L21/304; (IPC1-7): H01L21/304; B23K26/00