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Patent Searching and Data


Title:
CUTTING OF SILICON SEMICONDUCTOR WAFER
Document Type and Number:
Japanese Patent JPH11195626
Kind Code:
A
Abstract:

To provide a method of cutting a silicon semiconductor wafer, which avoids the problem of a normal rotary cutting and can enjoy the merit of prolongation of the life of an inner peripheral blade.

While a holding board vacuum-holding a wafer W repeats a forward and reverse rotation less than one rotation to a rotating inner peripheral blade 1, it makes cutting of the wafer progress by the rectilinear motion and before the blade 1 ends the cutting of the wafer, the rotation of the holding board is stopped to make the cutting of the wafer continue by the rectilinear motion only and when the blade 1 cuts in a reinforced part P, the wafer on the side, which is cut down, of the wafer is held by another standing-by suction holding board and thereafter, the part P is cut and is separated from the wafer.


Inventors:
SATO TSUTOMU
Application Number:
JP36054697A
Publication Date:
July 21, 1999
Filing Date:
December 26, 1997
Export Citation:
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Assignee:
NAOETSU ELECTRONICS CO LTD
International Classes:
B28D5/02; H01L21/301; H01L21/304; (IPC1-7): H01L21/304; B28D5/02; H01L21/301
Attorney, Agent or Firm:
Masahaya Hayakawa (2 outside)