Title:
CVD APPARATUS FOR CARBON NANOSTRUCTURE GROWTH AND PRODUCING METHOD OF CARBON NANOSTRUCTURE
Document Type and Number:
Japanese Patent JP2019052060
Kind Code:
A
Abstract:
To provide a CVD apparatus for carbon nanostructure growth capable of growing a carbon nanostructure over an entire surface of a processing object, and a producing method of the carbon nanostructure.SOLUTION: A CVD apparatus M for the carbon nanostructure growth according to the present invention includes a processing furnace 1, conveying means 15 for conveying a processing object Fm so as to pass through the processing furnace, gas introducing means 11, 12 for introducing a carbon-containing source gas into the processing furnace, and heating means 13 for heating the source gas, to grow the carbon nanostructure on a surface of the processing object passing through a processing chamber, in which the conveying means has a strip-like body Vm placing the processing object on it and travelling at a predetermined speed, and this strip-like body has a plurality of openings formed so as to allow the growth of the carbon nanostructure on a side of the mounting surface Fm1 of the processing object and is provided with a napped layer Rr on the surface.SELECTED DRAWING: Figure 1
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Inventors:
NAKANO MINAO
FUKUDA YOSHIRO
TSUKAHARA NAOKI
MURAKAMI HIROHIKO
FUKUDA YOSHIRO
TSUKAHARA NAOKI
MURAKAMI HIROHIKO
Application Number:
JP2017177166A
Publication Date:
April 04, 2019
Filing Date:
September 14, 2017
Export Citation:
Assignee:
ULVAC CORP
International Classes:
C01B32/164; C01B32/15
Attorney, Agent or Firm:
Seiryu Corporation