To obtain a new cyclic structure-bearing fluorine-containing monomer that is useful as a raw material for a functional material, a medicine/agrochemical, etc., has excellent transparency to radiation with a wavelength of above all ≤500 nm, especially ≤300 nm and is exceedingly useful as a monomer for producing a base resin of a radiation-sensitive resist composition having improved development properties due to having a phenol-like acidic hydroxy group, to use the polymer of the monomer as a base resin for a radiation-sensitive resist composition and to effectively utilize a hydroxy group having proper acidity so as to reduce, for example, swelling, prevent pattern degradation, suppress T-top shape development and improve dimensional uniformity.

The cyclic structure-bearing fluorine-containing monomer is represented by general formula (1) (Z is a polymerizable unsaturated group-containing bifunctional organic group).