Title:
【発明の名称】引裂強さが大きくて光学減衰の少ないシクロオレフィンコポリマー
Document Type and Number:
Japanese Patent JP3361809
Kind Code:
B2
Abstract:
A process for the production of cyclo-olefin copolymers (COC) with high tenacity by the copolymerisation of 0.1 to 99.9 wt %, in relation to the total quantity of monomers, of at least one monomer in which R<1>, R<2>, R<3>, R<4>, R<5>, R<6>, R<7> and R<8> are the same or different and represent a hydrogen atom or a C1-C8 alkyl radical or C6-C16 aryl radical, where identical radicals may have a different significance in the various formulae, 0 to 99.9 wt %, in relation to the total quantity of monomers, of a cyclo-olefin in which n is a number from 2 to 10, and 0.1 to 99.9 wt %, in relation to the the total quantity of monomers, of at least one acyclic 1-olefin in which R<9>, R<10>, R<11> and R<12> are the same or different and signify a hydrogen atom or a C1-C8 alkyl radical or C6-C16 aryl radical, in solution, in suspension, in the liquid cyclo-olefin monomer or cyclo-olefin monomer mixture or in the gas phase, at a temperature of -78 to 150 DEG C, at a pressure of 0.5 to 64 bar, in the presence of a catalyst consisting of a metallocene as the transition metal component and an aluminoxane for the linear type and/or for the cyclic type. In formulae VII and VIII, R<13> is a C1-C6 alkyl group or phenyl or benzyl and n is a whole number from 2 to 50. Polymerisation is conducted in the presence of a catalyst, the transition metal component of which is at least one compound of formula IX, in which: M<1> is titanium, zirconium, hafnium, vanadium, niobium or tantalum; R<14> and R<15> are the same or different and signify a hydrogen atom, a halogen atom, a C1-C10 alkyl group, a C1-C10 alkoxy group, a C6-C10 aryl group, a C6-C10 aryloxy group, a C2-C10 alkenyl group, a C7-C40 arylalkyl group, a C7-C40 alkylaryl group or a C8-C40 arylalkenyl group, and m may be one or two depending on the valency of the central atom M<1>, R<18> is =BR<19>, =AlR<19>, -Ge-, -Sn-, -O-, -S-, =SO, =SO2, =NR<19>, =CO, =PR<19> or =P(O)R<19>, where R<19>, R<20> and R<21> are the same or different and signify a hydrogen atom, a halogen atom, a C1-C10 alkyl group, a C1-C10 fluoroalkyl group, a C6-C10 fluoroaryl group, a C6-C10 aryl group, a C1-C10 alkoxy group, a C2-C10 alkenyl group, a C7-C40 arylalkyl group, a C8-C40 arylalkenyl group or a C7-C40 alkylaryl group or R<19> and R<20> or R<19> and R<21> form a ring with the atoms bonding them, M<2> is silicon, germanium or tin, R<16> and R<17> are the same or different and signify a mono or multi-nuclear hydrocarbon radical which can form a sandwich structure with the central atom M<1>. The metallocene of formula IX exhibits C2 symmetry if R<16> and R<17> are the same and, if R<16> and R<17> are different, a C1 symmetry in relation to the ligands R<16> and R<17> and the central atom M<1> bonding them.
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Inventors:
Blekner, Michael-Joachim
Deckels, Helmut
Frank, Osan
Deckels, Helmut
Frank, Osan
Application Number:
JP51760894A
Publication Date:
January 07, 2003
Filing Date:
January 31, 1994
Export Citation:
Assignee:
Tikona Gezel Shaft Mitt Beschlenktel Haftungu
International Classes:
C08F4/42; C08F4/642; C08F4/646; C08F4/6592; G02B6/00; C08F4/68; C08F4/72; C08F8/00; C08F12/00; C08F32/00; C08F210/00; C08F212/00; C08F232/00; C08F232/08; G02B1/04; C08F4/659; (IPC1-7): C08F4/642; C08F210/00; C08F232/00; G02B1/04; G02B6/00
Domestic Patent References:
| JP4268312A | ||||
| JP3255105A |
Attorney, Agent or Firm:
Kazuo Shamoto (5 outside)