DECOMPOSITION TREATMENT DEVICE OF GASEOUS ORGANIC HALOGEN COMPOUND AND DECOMPOSITION TREATMENT DEVICE OF LIQUID ORGANIC HALOGEN COMPOUND APPLYING THE SAME

Japanese Patent JP3472873

B2

PROBLEM TO BE SOLVED: To provide a decomposition treatment device of gaseous organic halogen compound and a decomposition treatment device of liquid organic halogen compound provided with the same device.
SOLUTION: This decomposition treatment device of gaseous organic halogen compound is provided with a gas introducing means which guides a gaseous organic halogen compound to a thermal decomposition means, the thermal decomposition means which generates decomposition gas by subjecting the gaseous organic halogen compound to the contact thermal decomposition with a heat generator and subjecting the gaseous organic halogen compound to the thermal decomposition due to radiation heat and a gas discharging means which supplies the gaseous organic halogen compound to the thermal decomposition means via the gas introducing means and discharges the decomposition gas which is generated by thermally decomposing the gaseous organic halogen compound in the thermal decomposition means from the thermal decomposition means. Further, this decomposition treatment device of liquid organic halogen compound has a constitution which consists of the decomposition treatment device of gaseous organic halogen compound and a gasification means which gasifies liquid organic halogen compounds.

Ken Kansa
Yoshihide Mukaiyama
Masatoshi Matsuba

JP2001222010A

December 02, 2003

July 23, 2001

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Ken Kansa

A62D3/30; A62D3/34; A62D3/40; B01J19/00; C07B37/06; C07C25/18; C07D319/24; A62D101/22; A62D101/28; (IPC1-7): B01J19/00; A62D3/00

JP712321A

Michizo Isono

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