Title:
DECOMPRESSION DRYING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND DECOMPRESSION DRYING METHOD
Document Type and Number:
Japanese Patent JP2019036654
Kind Code:
A
Abstract:
To provide a technique for performing a decompression processing at a decompression speed near to a desired decompression speed in a decompression drying device.SOLUTION: A decompression drying device 1 houses a substrate to which a processing liquid is adhered into a chamber, and dries the substrate by decompressing in the chamber. The decompression drying device 1 includes: the chamber; a decompression exhaust part; a valve 45 that adjusts a flow amount of the decompression exhaust; a target setting part 61 to which target data S61 is set; a table data acquisition part 62 that acquires table data S62 indicating a relationship between a pressure in the chamber due to the decompression exhaust and a reach time to the pressure in each predetermined valve opening level; an opening level determination part 63 that determines a valve opening level S63 at the time of executing a decompression dry processing on the basis of the table data S62 and the target data S61; and an operation control part 64 that controls the valve opening level. Thus, the decompression processing can be performed at the decompression speed near to a desired decompression speed in regardless of an individual difference of a device and a setting environment.SELECTED DRAWING: Figure 3
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Inventors:
NISHIOKA KENTARO
JITSUI YUSUKE
JITSUI YUSUKE
Application Number:
JP2017157731A
Publication Date:
March 07, 2019
Filing Date:
August 18, 2017
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD
International Classes:
H01L21/027; B05C9/12; F26B5/04; H01L21/304
Domestic Patent References:
| JP2016044897A | 2016-04-04 | |||
| JP2011165691A | 2011-08-25 | |||
| JP2006205078A | 2006-08-10 | |||
| JP2004047797A | 2004-02-12 | |||
| JP2006261379A | 2006-09-28 |
Attorney, Agent or Firm:
Takami Nishida